Mechanisms of Silicide Formation by Reactive Diffusion in Thin Films
نویسندگان
چکیده
منابع مشابه
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ژورنال
عنوان ژورنال: Diffusion Foundations
سال: 2019
ISSN: 2296-3642
DOI: 10.4028/www.scientific.net/df.21.1